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Scientific Paper

(Invited) Molecular Layer Deposition from Dissolved Precursors

Conference paper 2017

Johannes Fichtner, Yanlin Wu, Jakob Felix Hitzenberger, Thomas Drewello, Julien Bachmann

ECS Transactions, 80 (3), 63–73, 2017

View at publisher ↗

DOI 10.1149/08003.0063ecst

Summary

Molecular layer deposition moved from the gas phase to the liquid: a polyamide film is grown by alternating two complementary, self-limiting surface reactions, with the precursors dissolved in an organic solvent. The approach opens ALD/MLD-style layer-by-layer growth to the many reagents that exist only in solution.

Summary written by the openQCM team. The original abstract is on the publisher’s page.

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