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Scientific Paper

Area-Selective Growth of HfS2 Thin Films via Atomic Layer Deposition at Low Temperature Yuanyuan Cao, Tobias Wähler, Hyoungwon Park, Johannes Will, Annemarie Prihoda, Narine Moses Badlyan, Lukas

Journal article 2021

Tadahiro Yokosawa Fromm, Bingzhe Wang, Dirk M Guldi, Andreas Görling, Janina Maultzsch, Tobias Unruh, Erdmann Spiecker, Marcus Halik, Jörg Libuda, Julien Bachmann

Atomic Layer Deposition of Transition Metal Dichalcogenides and Applications in Water Splitting, 13054, 2021

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