# Area-Selective Growth of HfS2 Thin Films via Atomic Layer Deposition at Low Temperature Yuanyuan Cao, Tobias Wähler, Hyoungwon Park, Johannes Will, Annemarie Prihoda, Narine Moses Badlyan, Lukas

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- Authors: Tadahiro Yokosawa Fromm, Bingzhe Wang, Dirk M Guldi, Andreas Görling, Janina Maultzsch, Tobias Unruh, Erdmann Spiecker, Marcus Halik, Jörg Libuda, Julien Bachmann
- Journal: Atomic Layer Deposition of Transition Metal Dichalcogenides and Applications in Water Splitting
- Year: 2021
- Pages: 13054
- Instrument used: openQCM

## About this record

Article in Atomic Layer Deposition of Transition Metal Dichalcogenides and Applications in Water Splitting (2021) by Tadahiro Yokosawa Fromm et al. that used the openQCM quartz crystal microbalance.

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